Item | Parameter |
The size | a.100X100X23mmb.75X75X23mmc.63X63X23(can choose) |
Silicon size | φ3575mm |
The line | 3-4μm, The thinnest can be 2μm |
Mask and silicon displacement range | X/Y±2.5mm,(rotation) ±6° |
Worktable rotate around the principal axis | Coarse adjustment 360° can be fine adjusted. |
Worktable moving range | X,Y compose φ75mm |
The? worktables tee surface to the moulding board | 07.5mm |
Exposal light | GCQ200W over high pressure HG light,Exposal wave length,300436nm |
Exposal system should be above? | 7mw |
Exposal system uniformity of illuminance range should be in φ75mm | ±5 |
Microscopical lighting wave length | ≈545nm |
Time of exposure control range | 0.1 sec99 min |
Amplification of the binocular microscope | a. Two kinds ocular:10X,16Xb. Three kind plan objective :6X,9X,15Xc.Composed magnification ratio.:60X240X |
Vacuum contact pressure | ≥0.7kgf |
Dimension | 1000X850X980mm(two pcs) |
Weight | 200kg |